The resolution (or minimum feature) of optical systems is well known to the microlithography community as the Rayleigh criteria. It is so well known within this community that it is rarely mentioned ...

Designers of semiconductor lithography equipment have made some impressive strides over the last few years. But soon, they're going to be victims of their own success. Scientists at the National ...

To make smaller transistors so chips can pack more gates and deliver higher performance, lithography must use shorter light wavelengths to form the smaller features. To that end, developments to ...

There seems to be growing discussion in the industry about which lithographic technique will be dominant at the 45 nm node. The question is obviously of primary importance to process engineers and to ...

Fig. 1 | Metalens-based DLW lithography. Schematic diagrams of (a) the DLW lithography setup, (b) the metalens and its constructing unit cells. (c) The metalens in top view and cross-section view. (d) ...

Modern photolithography machines must deliver extraordinary precision on a repeatable basis, and in high volume production. In response to demands for increased throughput in the semiconductor ...